Applied Microscopy : eISSN 2287-4445 / pISSN 2287-5123

Cited by CrossRef (2)

  1. Byeong-Seon An, Yena Kwon, Jin-Su Oh, Yeon-Ju Shin, Jae-seon Ju, Cheol-Woong Yang. Evaluation of ion/electron beam induced deposition for electrical connection using a modern focused ion beam system. Appl. Microsc. 2019;49
    https://doi.org/10.1186/s42649-019-0008-2
  2. Byeong-Seon An, Yena Kwon, Jin-Su Oh, Miji Lee, Sangwoo Pae, Cheol-Woong Yang. Amorphous TaxMnyOz Layer as a Diffusion Barrier for Advanced Copper Interconnects. Sci Rep 2019;9
    https://doi.org/10.1038/s41598-019-56796-y